Facilities, Devices and Instruments

• HV deposition of ultrathin films & multilayer systems.
• simultaneous thin-film deposition from 5 sputtering targets possible.
• in-situ thermal annealing
• reactive sputtering under Argon or Oxygen atmosphere

• structure analysis of powder materials and small bulks
• Phase identification, Phase quantification, Texture, Stress, Single Crystal Diffraction, Small Angle X-ray Scattering
• fast real-time data collection with unique HI-STAR area detector
• simultaneous large chi and 2θ data acquisition for fast powder and texture investigations
• highly intense, point-like parallel beam using cross-coupled Göbel Mirrors
• kinetic studies of phase transitions

• grazing incidence X-ray diffraction
• uses small incident angles for the incoming X-ray, so that diffraction can be made surface sensitive
• used to get information like

  thickness

  roughness

  density

  from thin films of 0.1 nm to 100 nm

• study of properties of the surface at nanometer scale
• visualizing and performing quantitative measurements of mechanical (hardness, elasticity, viscidity), electrical (conductivity, capacity, distribution of surface charge) and magnetic properties of the sample
• working with sizes from several microns to angstrom
• combination of AFM (Atomic Force Microscope) and MFM (Magnetic Force Microscope)
• sample environment: air, controlled atmosphere and liquids

• comminution / mechanical alloying of powder precursors
• pulverizes and mixes soft, medium-hard to extremely hard, brittle and fibrous materials
• high speed of 30 to 400 min-1 in combination with the very large sun wheel diameter of 300 mm guarantee extremely high fineness in a short time
• 4 grinding stations for grinding jars with a nominal volume of 12 to 500 ml
• reproducible results due to energy and speed control
• direction reversal
• sample environment : liquid, inert gas (with special vials)
• grinding bowls: stainless steel, WC, ZrO2, sintered Al2O3
• Material feed size* < 10 mm
• Final fineness* < 1 µm, for colloidal grinding < 0.1 µm (*depending on feed material and instrument configuration/settings)

• kinetics of phase transitions
• stability, phase transitions, crystallization, melting
• temperature : RT - 1600°C
• sample environment : inert gas, vacuum
• corundum (Al2O3) and platinum (Pt) crucibles
• heating and cooling rates : 0.1 up to 20 K/min

• thermal expansion
• kinetics of phase transitions
• temperature: RT - 1600°C
• sample environment : inert gas, reactive gas, vacuum
• heating rate: < 5 K/min

←
• with polarisator, analysator, electromagnet and HeNe-laser
• with 2 Tesla electromagnet

→
Cryostat to combine MR and MOKE measurements (MR: magneto resistance; MOKE: Magneto-Optic Kerr Effect)

• sample environment: air, vacuum
• temperature: up to 500°C depending on specimen size.

• computer controlled operation: temperature-time heating and cooling profiles, thermal cycles
• thermal annealing (max. 1200°C)
• sample environment : inert gas, vacuum
• max. specimen size : diameter = 10,0cm, height = 6,3cm

• drying aqueous or organic solutions, emulsions, suspension, dispersion etc.
• evaporation of moisture from an atomised feed by mixing the spay and the drying medium (air)
• applications:

  - spray drying
  - micronizations
  - micro encapsulation
  - englobing

• max. inlet temperature: 220°C
• max. evaporation output: 1.0 kg H₂O/h
• spraying gas: compressed air 200 - 1000 litre/h, 5 - 8 bar

• filter to protect aspirator and ambient from fine particles
• one polyester deep-bed filter and one PTFE membrane filter for product recovery included

• 20-500 μm gap width,
• 30.000 turns/min
• water cooling system

• amount of approx. 10 - 20 g
• temperature till 3500°C
• water-cooled Cupper crucible plate
• tungsten firing pin